Search results for "Ion plating"
showing 8 items of 8 documents
Investigations of TiO2 films deposited by different techniques
1991
High refractive TiO2 films deposited by reactive electron beam evaporation, reactive ion plating and dip coating have been characterized by optical spectroscopy, electron spectroscopy for chemical analysis, Rutherford backscattering spectroscopy, nuclear reaction analysis and Raman spectroscopy. The spectral refractive index n exhibits a strong dependence on the deposition conditions. These findings will be connected to variations in density, stoichiometry, hydrogen content (H2O) and binding structure of the layers. A strong correlation is found between optical quantities and microscopic properties of TiO2 films.
Interference-Based Chromatic Coatings by Ion Plating Plasma Assisted Deposition Technology
2010
The goal of replacing widespread and inexpensive galvanic treatments with suitable vacuum deposition techniques, in order to eliminate the environmental hazards and their polluting effects, is becoming, in some cases, more tangible. Shorter cleaning cycles, shorter pump-down times, reduced heating times of substrates and higher deposition rates allow the costs of new plasma-assisted processes to become competitive with respect to galvanic ones. Moreover, vacuum treatments offer superior mechanical and optical properties and non-conductive substrates (like glass, ceramics, plastics) can be more easily coated. This work describes the results obtained with Ion Plating Plasma Assisted depositio…
Fabrication and Characterisation of Reverse Proton Exchange Optical Waveguides in Neodymium Doped Lithium Niobate Crystals
2005
In this work, the complete fabrication process which combines Proton Exchange (PE) and Reverse Proton Exchange (RPE) in Neodymium doped LiNbO3 channel waveguides is reported. To produce the PE-RPE channel waveguides the fabrication of dielectric SiO2 masks had to be implemented. For this propose, we adopted a technique based on the Ion Plating Plasma Assisted Deposition of SiO2 followed by the standard ultraviolet photolithographic patterning. On the other hand, we determined the main optical and spectroscopic properties of Nd3+ ions in the channel waveguides including the study of the lifetime as function as the polarisation.
New Cost Effective Titanium Based Protective and Decorative Coatings by Ion Plating Plasma Assisted IPPA
2009
The activity aiming to replace galvanic treatments by vacuum processes is based on the effort to reduce the production costs and to set-up new decorative effects impossible to be galvanically realised because the use of dielectric materials. This work describes cost effective metal-oxide and oxide-metal-oxide decorative coatings based on the use of titanium as basic material deposited by Ion Plating Plasma Assisted from Reactive Magnetron Sputtering source. A new multilayer protective and decorative structure, based on the use of titanium and titanium oxides is also presented. The protective effect against aggressive environment is obtained by alternating layers of metal and metal-oxide mix…
Metal-organic chemical vapor deposition of Cr2O3 and Nd2O3 coatings. Oxide growth kinetics and characterization
2000
Thin oxide films of Cr2O3 and Nd2O3 were prepared, using Metal-Organic Chemical Vapor Deposition (MOCVD) technique, to protect stainless steels against corrosion at high temperature. The conditions of precursor volatilization were studied by thermogravimetry. Deposited film growth kinetics depended on the deposition parameters, particularly substrate temperature, gas flow rate and location of substrate in the coating reactor. The influence of the deposition parameters on the deposition rate and the uniformity of the films is discussed. The oxide films were characterized by scanning electron microscopy (SEM), X-ray diffraction (XRD), transmission electron microscopy (TEM) and atomic force mi…
Effect of reactive ion beam etching on the photoluminescence of CdTe epitaxial layers
2008
http://link.aip.org/link/?JAPIAU/103/056108/1
Thermal and plasma enhanced atomic layer deposition of SiO2 using commercial silicon precursors
2014
In this paper, we report ALD deposition of silicon dioxide using either thermal or plasma enhanced atomic layer deposition (PEALD). Several aminosilanes with differing structures and reactivity were used as silicon precursors in R&D single wafer ALD tools. One of the precursors was also tested on pilot scale batch ALD using O3 as oxidant and with substrates measuring 150 × 400 mm. The SiO2 film deposition rate was greatly dependent on the precursors used, highest values being 1.5-2.0 Å/cycle at 30-200°C for one precursor with an O2 plasma. According to time-of-flight-elastic recoil detection analysis measurements carbon and nitrogen impurities were relatively low, but hydrogen content i…
Cost Effective Treatments to Replace Galvanic Processes
2009
Some of the most severe problems in the replacement of galvanic treatment with PVD coatings reside, first of all, in the higher costs of vacuum processes and in the difficulty to coat many 3D small samples. This work describes the results obtained by using energetic deposition vacuum processes, of the family of Ion Plating Plasma Assisted (IPPA), using both thermal and sputtering sources, able to reduce dramatically the duration of deposition process and to eliminate the substrate heating and their pre-cleaning. Regarding the small 3D samples, an innovative structure, named "Ionic Rotarybarrel" is presented. The realised treatments are in the fields of decorative, protective and tribologica…